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Hidróxido de tetrametilamonio, solución acuosa al 2,38 % p/p, grado electrónico, 99,9999 % (base metálica), Thermo Scientific Chemicals
Description
Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Specifications
Specifications
| Nombre del producto químico o material | Tetramethylammonium hydroxide |
| Color | De incoloro a amarillo |
| Notas del porcentaje del ensayo | (base metálica) |
| Fórmula lineal | (CH3)4NOH |
| Cantidad | 250 mL |
| Número UN | UN1835 |
| Beilstein | 3558708 |
| Sensibilidad | Air Sensitive |
| Índice Merck | 14,9224 |
| Información de solubilidad | Soluble in water. |
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RUO – Research Use Only
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